Figure 2 illustrates the conventional CV characteristics measured by the Agilent 4284A (Agilent, Santa Clara, CA, USA). From the comparison of Figure 1b and Figure 2, it is clear that there is an obvious hysteresis between the CV curves (ramp up and ramp down) measured by the pulse technique while there is almost no hysteresis in the conventional test. The large hysteresis is revealed by rapid characterization provided by the pulse CV technique, (in the order of several hundred micros), and the traps are not recovered completely before the end of the measurement. The pulse CV technique tracks the trap density in the oxide more accurately, or in other words, the conventional test underestimates the trap density in the oxide. The verification of the influence of test time on change of delta Vg will be fully discussed later. We firstly give a possible explanation for the horizontal shift of the CV curves measured by the pulse technique. The shift of the curves is attributed to charge trapping/detrapping in oxide [25,27]. In our case, the charges existing in the oxide probably belong to as-grown fixed positive charges (oxygen vacancies) with high energy levels or probably are trapped in as-grow electron traps in the high-k oxide. When the gate is applied with a positive bias voltage (Vg > 0), electrons are de-trapped from the as-grown electron traps to the metal gate through tunneling and the net positive charges in the oxide lead to the CV curves shifting negatively. Similarly, if a negative voltage (Vg
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